Introduction A sample size justification is required for all studies and should give the minimum
number of subjects to be recruited for the study to achieve its primary objective. The aim of …

The critical source of haze contamination which mainly occurred on MoSiN surface and the
interface of MoSiN and quartz is known as sulfuric ions remained after mask process. In this …

In this study, the method for achieving precise CD MTT (critical dimension mean to target) in
manufacturing attenuated PSM (phase shift mask) was investigated. As the specification for …

In this study we investigated the defect due to pellicle frame materials for repeating exposure
in months. Defects were found in the sub-pellicle and the defect density was high in the 4 …

As pattern size is shrinking, required mask CD specification is tighter and its effect on wafer
patterning is more severe. Recent study showed that the effect of mask local CD variation of …

The ability to eliminate the critical source of haze contamination which can be derived from
the cleaning chemistry residues and mass production environment has become a major …

CD control of FEP-171 is difficult due to abnormal CD variation in single puddle development.
Fogging analysis patterns show that space CD in large open region is smaller than that in …

… Jea-Young Jun, Ji-Sun Ryu, Yongk-Yoo Choi, Oscar Han Jea-Young Jun, Ji-Sun Ryu,
Yongk-Yoo Choi, Oscar Han, "The surface treatment for prevention of growing defect," Proc. SPIE …

As the design rule of the semiconductor circuit shrinks, the specification for photomask
becomes tighter. So, more precise control of CD MTT (Critical Dimension Mean to Target) is …

It is intended to clarify the feasibity of 0.15 μm generation mask fabrication with the
photomask repeater that is based on a KrF stepper(step-and-repeat exposure system). In a …